InAsSb Nanowire and Nickel Thin Film Analysis for IR Photodetector Applications
The focus of this research is on two aspects related to the fabrication of practical nanowire-based IR detectors. Experimentally verifying the validity of finite element-based simulations for InAsSb nanowires to determine the influence of pitch size on nanowire absorptance peaks and investigating the transmittance and conductance of nickel thin films to determine the optimal layer thickness which maximizes these properties. Based on the comparison between the experimental FTIR data and the theoretical simulation data, it can be concluded that the experimental data closely approximates the simulation data, with the position and magnitude of the absorptance peaks matching very closely. Also, it can be seen that increasing pitch sizes tend to redshift the absorptance peaks further into the IR range. Using a discrete relative change optimization method with equally weighted transmittance and resistivity, the optimal nickel film thickness was found to be approximately 3.3nm. This thickness gives transmittance and resistivity values of 80% and 1.7 x 10-6 Ωm, respectively.
LicenseAuthors who publish with this journal agree to the following terms:
Authors retain copyright and grant the journal right of first publication with the work simultaneously licensed under a Creative Commons Attribution License that allows others to share the work with an acknowledgement of the work's authorship and initial publication in this journal.
Authors are able to enter into separate, additional contractual arrangements for the non-exclusive distribution of the journal's published version of the work (e.g., post it to an institutional repository or publish it in a book), with an acknowledgement of its initial publication in this journal.
Authors are permitted and encouraged to post their work online (e.g., in institutional repositories or on their website) prior to and during the submission process, as it can lead to productive exchanges, as well as earlier and greater citation of published work.